Overview

The main topics of IBMM 2010 will be the following:

  • Fundamentals of ion-solid interaction
  • Nanostructure synthesis and modification
  • Ion-driven self-organization, nanopatterning
  • Defect-induced modification of materials
  • Ultra-low energy implantation
  • Focused ion beams, ion lithography
  • Cluster ions, single ion, swift heavy ions, highly charged ions
  • Plasma immersion, plasma-induced modification
  • Modification of semiconductors, metals and ceramics
  • Application to electronic, magnetic and optical materials
  • Irradiation effects in insulators and nuclear materials
  • Modification of polymers and biomaterials

Conference Format

IBMM 2010 will run as a single session. There will be oral sessions during the day and poster sessions starting  at mid-afternoon on Monday and Thuesday. Following the tradition of IBMM, a large portion of contributed papers will be presented as posters. The preliminary program will be available on the conference website by May 31st 2010. The scientific conference program will start in the morning of Monday, August 23 and will finish on Friday, August 27.

The accepted absract will be available online in the weeks prior to the Conference and the registrants will receive a book of abstracts upon arrival.

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